Minghwei Hong (洪銘輝)

Professor
Ph.D., Materials Science and Engineering, University of California, Berkeley, December 1980
E-mal: mhong@mx.nthu.edu.tw; mhong@mse.nthu.edu.tw

 

1. Basic information

Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 300, Taiwan, ROC

Email: mhong@mx.nthu.edu.tw; mhong@mse.nthu.edu.tw

Tel: 886-3-5715131ext2283       Fax: 886-3-5722366

2. Education 

Ø        Ph.D., Materials Science and Engineering, University of California, Berkeley, December 1980

Ø        M.S., Materials Science and Engineering, University of California, Berkeley, December 1978

Ø      B.S., Physics, National Taiwan University, June 1973

3. Current position

Professor, Dept. of Materials Science and Engineering, National Tsing-Hua University (NTHU)

Professional Experience:

Ø        2000-2003 Distinguished Member of Technical Staff, High Speed Electronic Devices and Photonic Interfaces Research, Agere Systems, Murray Hill, NJ

Ø        1999-2000 Distinguished Member of Technical Staff, Semiconductor Research Laboratory, Bell Laboratories, Lucent Technologies, Murray Hill, NJ

Ø        1981-1999 Member of Technical Staff, Materials Research Laboratory and Semiconductor Research Laboratory, Bell Laboratories, Murray Hill, New Jersey

Ø        1980-1981 Staff Scientist II, Lawrence Berkeley Laboratory, Univ. California, Berkeley, California

4. Research interest

1.      Novel epitaxy and studies of interfacial structures – materials science in its nano-meter scale

2.      Growth of high-quality semiconductors, metals, oxides using multiple-chamber UHV system (including molecular beam epitaxy) for studies in materials science, physics, and devices

3.      Studies, growth, and device processing of novel heterostructures in metal/semiconductor, oxide/semiconductor, semiconductor/semiconductor, oxide/oxide, oxide/nitride, and metal/oxide/semiconductor with excellent interfacial properties

4.      Next generation high speed and high power electronic devices

5.      Quantum well and quantum dot materials and their device applications

6.      All vacuum in-situ processing - electron cyclotron resonance (ECR) plasma etching and molecular beam epitaxial regrowth - for research in new electronic materials, novel growth techniques, high performance electronic/opto-electronic devices, and innovative processing.

5. Major awards and honors

2003 TSMC endowed chair professorship in National Tsing Hua University

1999 Distinguished Technical Staff Award for sustained research achievements by Bell Laboratories, Lucent Technologies.

1988 Outstanding Paper Award of the Center for Electronics and Electrical Engineering form National Institute of Standards and Technology.

1981-1997 705th among the ISI's 1120 Most Cited Physicists.